X – Ray Diffraction Laser THERMO LOGG Contact Angle Analyzer Langmuir – Blodgett Film Deposition Scanning Electron Microscope with EDS (X-ray spectrometry) Small Angle X-Ray Scattering Apparatus Wide Angle X-Ray Scattering Apparatus Mercury Porosimeter Mass Spectrometer Nitrogen Porosimeter ultra-microtome AA GC-MS Scanning Electron Microscope with EDS (X-ray spectrometry) Proteome analysis [Proteomics] Remote Measurement System Transmission Electron Microscope CNC ΑGIECharmilles ΑCTSPARK FW-1P [CNC AGIE] CNC DMG CTX 510 Eco PHOTRON FASTACAM SA3 INSTRON 8801 Testing Device ROMER OMEGA R-SCAN & 3D RESHAPER LASER Cutter Pantograph with extra PLASMA torch CNC ΙDA XL 1200 Optical and Contact Coordinate Measuring Machine TESA MICRO-HITE 3D  RSV-150 Remote Sensing Vibrometer Ground Penetration Radar [GPR] Audio Magneto Telluric Optical Time Domain Reflectometers [OTDR] Non ion Rad Electric e-mat analysis Thermogravimetric Analyzers - Differential Scanning Calorimetry Magnetron Deposition Metal Deposition Grid Computing Center

Metal Deposition [METAL-DEP]

Metal Evaporator. The Mantis EV-Series mini e-beam evaporators are constructed from high-quality, strictly UHV-compatible materials and are fully bakeable to 250°C. The mounting hearths for the source materials and the surrounding evaporation head are highly efficient cooled, ensuring a rapid heat transfer to the cooling water. This allows all but the emission filament and the source material to remain at near ambient temperature, effectively eliminating the structural outgassing which often presents a problem with traditional electron beam evaporators, effusion cells and thermal evaporation boats.       

Contact person:

Lykoyrgos Magafas
tel. (+30) 251046267
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metal-dep

All of the M-EV and QUAD-EV models have integrated flux monitoring plates. These provide real-time feedback of the deposition rate and also can be used in a closed loop control for absolute rate stability and control. The flux monitoring plates are located at the top of the source and below the shutter and can provide an accurate reading of the evaporation rate even with the shutter closed. E-beam evaporators are installed for thin film deposition of refractory metals or high-temperature ceramics.

Surface Science. The EV sources allow sub-monolayer per minute rate control enabling precise surface loading to be achieved.

Lift-Off Processes. The minimal heat-load from the sources coupled with the small spot profile from the source-leading to low angular spread at the sample face-makes this an excellent choice for achieving high-quality metal film structures.